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Coated silicas and small‐angle X‐ray intensity behaviour
Author(s) -
Benedetti A.,
Ciccariello S.
Publication year - 1994
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s0021889893008386
Subject(s) - coating , scattering , small angle x ray scattering , porosity , intensity (physics) , materials science , x ray , constant (computer programming) , small angle scattering , electron density , electron , optics , molecular physics , chemistry , composite material , physics , nuclear physics , computer science , programming language
Porod plots of the small‐angle X‐ray intensities scattered by porous silicas that have undergone different coating processes show deviations from the predicted constant asymptotic behaviour. The deviations are ascribed to the effect of the coating film. We propose a constant‐electron‐density model for these films. The theoretical scattering function calculated from the model permits an estimate of the film thickness, electron density and average number of coating molecules per unit area of the support.