Determination of crystal imperfection by X‐ray diffraction in a strong acoustic field
Author(s) -
Zolotoyabko E.,
Polikarpov I.,
Panov V.,
Schvarkov D.
Publication year - 1992
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s0021889891010531
Subject(s) - diffraction , wavelength , distortion (music) , amplitude , crystal (programming language) , optics , x ray , quartz , physics , lattice (music) , materials science , computational physics , acoustics , optoelectronics , computer science , amplifier , cmos , composite material , programming language
A study of X‐ray diffraction in single silicon and quartz crystals in a strong ultrasonic field has been carried out. The dependence of diffraction intensity I ( w ) on sound amplitude w has been obtained right up to the kinematical limit I k = I (∞). It is shown that the ratio η = I (∞)/ I (0) depends on the crystal quality. Experimental data for different reflections, sound frequencies and X‐ray wavelengths are compared with the model calculations for several lattice‐distortion mechanisms.