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An X‐ray determination of the thermal expansion of α‐phase Cu–Si alloys at high temperature
Author(s) -
Pradhan S. K.,
De M.
Publication year - 1989
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s0021889888014529
Subject(s) - thermal expansion , atmospheric temperature range , alloy , materials science , thermodynamics , lattice (music) , thermal , lattice constant , analytical chemistry (journal) , phase (matter) , chemistry , metallurgy , diffraction , optics , physics , organic chemistry , chromatography , acoustics
Lattice parameters for four Cu–Si alloys containing 2.2, 4.3, 6.4 and 8.7 at.% Si in the solid‐solution range have been calculated in the temperature range 303–928 K. The lattice parameters increase slowly in a nonlinear manner with rise in temperature. The calculated linear thermal‐expansion coefficients ( α ) at room temperature increase with increasing solute concentration (Si) but decrease almost linearly with increasing temperature, the rate of decrease being higher for alloys with higher solute concentration. All the alloys have almost the same average α value ( α av ~ 16.0 × 10 −6 K −1 ), which is the value of α at the temperature interval 615–625 K for all the alloy compositions.