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Computer simulation of convergent‐beam electron diffraction patterns from bicrystals
Author(s) -
Blom N. S.,
Schapink F. W.
Publication year - 1985
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s0021889885009955
Subject(s) - electron diffraction , diffraction , boundary (topology) , plane (geometry) , beam (structure) , translation (biology) , electron , cathode ray , materials science , silicon , optics , crystallography , physics , condensed matter physics , geometry , chemistry , mathematics , mathematical analysis , optoelectronics , quantum mechanics , biochemistry , messenger rna , gene
A computer program for simulating convergent‐beam electron diffraction patterns from single crystals and bicrystals is described. The program is based on the dynamical theory of electron diffraction, and the intensity of a convergent‐beam disc is constructed from the individual intensities of a number of plane waves incident on the specimen. For the bicrystal case, this program allows the influence of parameters such as the location of the boundary plane and a rigid translation at the boundary to be investigated. These effects are discussed for a horizontal (111) twin boundary in silicon.