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Quantitative analysis of intensitities in X‐ray topographs by enhanced microfluorescence
Author(s) -
Weissmann S.,
Greenhut V. A.,
Chaudhuri J.,
Kalman Z. H.
Publication year - 1983
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s0021889883011164
Subject(s) - materials science , silicon , fluorescence , optics , x ray fluorescence , scanning electron microscope , excitation , bent molecular geometry , optoelectronics , composite material , physics , quantum mechanics
A method is presented for enhancing the fluorescence of the silver precipitates in the microfluorescent analysis of X‐ray topographs by scanning electron microscopy or similar electron microprobes. The method is based on the indirect excitation of the silver fluorescence by depositing a thin suitable metal film on the emulsion of a nuclear track plate. Theoretical aspects of the method are presented and experimentally verified. The method was applied to determine the elastic strain distribution in a bent silicon plate containing a hole by measuring the opacities of the exposed and developed topograph obtained from the specimen.