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An absolute intensity standard for small‐angle X‐ray scattering measured with position‐sensitive detectors
Author(s) -
Russell T. P.
Publication year - 1983
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s0021889883010857
Subject(s) - intensity (physics) , scattering , detector , position (finance) , optics , small angle x ray scattering , small angle scattering , materials science , beam (structure) , electron density , amorphous silica , amorphous solid , physics , electron , chemistry , nuclear physics , crystallography , finance , economics , chemical engineering , engineering
Silica sols have been evaluated as a means of determining the incident beam intensity using position‐sensitive detectors. Analysis of the total integrated small‐angle X‐ray scattering yielded an electron density of the suspended silica particles that was within 4% of the electron density of amorphous silica. The sols were found to be particularly well suited for use with position‐sensitive detectors and represent a convenient, rapid, and accurate means to determine the incident beam intensity.