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The calculation of intensities diffracted by a partially oriented powder with a layer structure
Author(s) -
Plançon A.
Publication year - 1980
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s002188988001271x
Subject(s) - diffraction , orientation (vector space) , intensity (physics) , detector , layer (electronics) , optics , materials science , limit (mathematics) , x ray crystallography , physics , powder diffraction , computational physics , geometry , mathematics , mathematical analysis , nanotechnology , nuclear magnetic resonance
It is well known that the orientation of particles inside a sample modifies the diffracted intensities. The present paper shows how this orientation can be introduced into the intensity calculations in order to reproduce the experimental diagrams. The calculations are presented for the case of asymmetrical diffraction. This corresponds not only to the conditions of photographic recordings but also to recordings with a linear detector, which is currently used. The symmetrical diffraction is envisioned as a limit case.