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X‐ray studies of growth striations in Fe–2.8 wt%Si alloy single crystals
Author(s) -
Polcarová M.,
Kadečková S.,
Vaněk P.
Publication year - 1980
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s0021889880012095
Subject(s) - alloy , materials science , crystallography , x ray , silicon , optics , metallurgy , chemistry , physics
Growth striations in Fe–Si alloy single crystals are studied by X‐ray diffraction topography. Variations of interplanar spacing are measured using double‐crystal reflection topographs and variations of Si content are calculated taking into account the surface stress relaxations. The results are compared with those obtained by electron‐microprobe analysis. The contrast observed in Lang transmission topographs is explained on the basis of the dynamical theory of X‐ray diffraction.