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Etching of bismuth‐antimony crystals in a magnetic field
Author(s) -
Bhatt V. P.,
Vyas A. R.,
Pandya G. R.
Publication year - 1976
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s0021889876010479
Subject(s) - bismuth , antimony , cleavage (geology) , etching (microfabrication) , materials science , magnetic field , condensed matter physics , crystallography , chemistry , nanotechnology , metallurgy , physics , composite material , layer (electronics) , quantum mechanics , fracture (geology)
Single crystals of Bi–Sb alloys were etched in transverse magnetic fields ranging from 1000 to 4000 gauss. It has been shown from the study of the etch pattern on the oppositely matched cleavage faces and from successive etching that the dislocations move in the magnetic field.

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