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A lattice‐statics approach to the calculation of diffuse X‐ray scattering by interstitials in metals
Author(s) -
Benedek R.
Publication year - 1975
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s0021889875009995
Subject(s) - scattering , lattice (music) , atom (system on chip) , interstitial defect , crystal structure , materials science , statics , x ray , condensed matter physics , crystallography , molecular physics , chemistry , physics , optics , classical mechanics , computer science , acoustics , embedded system , doping
The calculation of the intensity of diffuse X‐ray scattering by interstitials involves the evaluation of a crystal structure factor which accounts for both the configuration of the interstitial atom and the distortion of the surrounding lattice and is discussed here.

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