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A method of producing optical diffraction masks representing static disorder in crystals using computer‐generated patterns
Author(s) -
Welberry T. R.,
Taylor C. A.,
Milledge H. J.
Publication year - 1972
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s0021889872008957
Subject(s) - diffraction , optics , etching (microfabrication) , range (aeronautics) , materials science , quality (philosophy) , crystallography , physics , nanotechnology , chemistry , layer (electronics) , quantum mechanics , composite material
The paper describes the use of computer‐generated patterns and a photo‐etching technique to produce high quality optical diffraction masks containing several thousand holes for the study of short‐range order in crystals.