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Nonlinear continuum growth model of multiscale reliefs as applied to rigorous analysis of multilayer short‐wave scattering intensity. I. Gratings
Author(s) -
Goray Leonid,
Lubov Maxim
Publication year - 2013
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s0021889813012387
Subject(s) - optics , materials science , diffraction , nonlinear system , boundary value problem , scattering , sputter deposition , computational physics , thin film , physics , sputtering , nanotechnology , quantum mechanics
It is shown that taking into proper account certain terms in the nonlinear continuum equation of thin‐film growth makes it applicable to the simulation of the surface of multilayer gratings with large boundary profile heights and/or gradient jumps. The proposed model describes smoothing and displacement of Mo/Si and Al/Zr boundaries of gratings grown on Si substrates with a blazed groove profile by magnetron sputtering and ion‐beam deposition. Computer simulation of the growth of multilayer Mo/Si and Al/Zr gratings has been conducted. Absolute diffraction efficiencies of Mo/Si and Al/Zr gratings in the extreme UV range have been found within the framework of boundary integral equations applied to the calculated boundary profiles. It has been demonstrated that the integrated approach to the calculation of boundary profiles and of the intensity of short‐wave scattering by multilayer gratings developed here opens up a way to perform studies comparable in accuracy to measurements with synchrotron radiation, at least for known materials and growth techniques.