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Accurate measurements of intrinsic scattering from window materials by use of a vacuum camera
Author(s) -
Masunaga Hiroyasu,
Sakurai Kazuo,
Akiba Isamu,
Ito Kazuki,
Takata Masaki
Publication year - 2013
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s0021889813002628
Subject(s) - mica , materials science , scattering , beryllium , silicon carbide , window (computing) , silicon nitride , polyimide , range (aeronautics) , optics , silicon , analytical chemistry (journal) , chemistry , optoelectronics , composite material , organic chemistry , physics , operating system , layer (electronics) , computer science
The intrinsic scattering from eight window materials commonly used at synchrotron facilities has been evaluated in the range 0.07 < q < 4 nm −1 by the use of a vacuum camera. Poly(oxydiphenylene‐pyromellitimide) film, a polyimide film widely used as a window material for vacuum chambers, gave rise to two peaks at q = 0.8 and 4 nm −1 . Poly(ether‐ether‐ketone) gave no Bragg peaks, although the background scattering was relatively high over the entire q range. When natural mica, synthetic mica, quartz glass, beryllium, silicon nitride and silicon carbide were compared, synthetic mica showed the lowest scattering in the range 0.6 < q < 5 nm −1 , indicating that it is the most suitable window material for this q range.