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High‐energy ultra‐small‐angle X‐ray scattering instrument at the Advanced Photon Source
Author(s) -
Ilavsky Jan,
Allen Andrew J.,
Levine Lyle E.,
Zhang Fan,
Jemian Pete R.,
Long Gabrielle G.
Publication year - 2012
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s0021889812040022
Subject(s) - scattering , optics , photon energy , range (aeronautics) , photon , x ray optics , physics , angular resolution (graph drawing) , reflection (computer programming) , advanced photon source , small angle scattering , crystal (programming language) , small angle x ray scattering , x ray , materials science , computational physics , beamline , computer science , beam (structure) , mathematics , combinatorics , composite material , programming language
This paper reports recent tests performed on the Bonse–Hart‐type ultra‐small‐angle X‐ray scattering (USAXS) instrument at the Advanced Photon Source with higher‐order reflection optics – Si(440) instead of Si(220) – and with X‐ray energies greater than 20 keV. The results obtained demonstrate the feasibility of high‐energy operation with narrower crystal reflectivity curves, which provides access to a scattering q range from ∼2 × 10 −5 to 1.8 Å −1 and up to 12 decades in the associated sample‐dependent scattering intensity range. The corresponding size range of the scattering features spans about five decades – from less than 10 Å to ∼15 µm. These tests have indicated that mechanical upgrades are required to ensure the alignment capability and operational stability of this instrument for general user operations because of the tighter angular‐resolution constraints of the higher‐order crystal optics.