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Contrast matching of an Si substrate with polymer films by anomalous dispersion at the Si K absorption edge
Author(s) -
Okuda Hiroshi,
Takeshita Kohki,
Ochiai Shojiro,
Kitajima Yoshinori,
Sakurai Shinichi,
Ogawa Hiroki
Publication year - 2012
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s002188981105206x
Subject(s) - scattering , reflection (computer programming) , materials science , absorption (acoustics) , dispersion (optics) , optics , substrate (aquarium) , nanostructure , enhanced data rates for gsm evolution , total internal reflection , absorption edge , soft matter , thin film , molecular physics , condensed matter physics , optoelectronics , physics , chemistry , composite material , nanotechnology , colloid , computer science , telecommunications , oceanography , band gap , programming language , geology
Anomalous dispersion at the Si K absorption edge has been used to control the reflection from the interface between a film and an Si substrate, which otherwise complicates the nanostructure analysis of such a film, particularly for the soft‐matter case, in grazing‐incidence small‐angle scattering. Such a reflectionless condition has been chosen for a triblock copolymer thin film, and two‐dimensional grazing‐incidence small‐angle scattering patterns were obtained without the effect of the reflection. The present approach is useful for analysing nanostructures without introducing complicated corrections arising from the reflection.