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High diffraction efficiency at hard X‐ray energy in a silicon crystal bent by indentation
Author(s) -
Barrière Nicolas,
Guidi Vincenzo,
Bellucci Valerio,
Camattari Riccardo,
Buslaps Thomas,
Rousselle Julien,
Roudil Gilles,
Arnaud FranoisXavier,
Bastie Pierre,
Natalucci Lorenzo
Publication year - 2010
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s0021889810038343
Subject(s) - optics , bent molecular geometry , diffraction , curvature , materials science , silicon , diffraction efficiency , crystal (programming language) , radius of curvature , x ray , physics , optoelectronics , geometry , composite material , mean curvature , computer science , mathematics , mean curvature flow , programming language
The diffraction properties of a crystalline silicon plate of which one face was mechanically indented have been studied. This treatment induced a permanent curvature in the sample, which allowed a diffraction efficiency of 88% for 150 keV photons, i.e. a reflectivity of 64% including the absorption. This efficiency is constant over 14 arcseconds and is very close to the theoretical expectation, meaning that the curvature is highly homogeneous. The technique enables the fabrication, in a very reproducible fashion, of crystals for the realization of an astronomical hard X‐ray concentrator (Laue lens).