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Optimization of a bent perfect Si(111) monochromator at a small take‐off angle for use in a stress instrument
Author(s) -
Seong BaekSeok,
Em Vyacheslav,
Mikula Pavol,
Šaroun Jan,
Kang MiHyun
Publication year - 2010
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s0021889810008551
Subject(s) - monochromator , bent molecular geometry , optics , diffraction , figure of merit , crystal (programming language) , resolution (logic) , position (finance) , materials science , reflectivity , stress (linguistics) , crystallography , physics , chemistry , computer science , composite material , wavelength , linguistics , philosophy , finance , artificial intelligence , economics , programming language
The reflectivity and resolution properties of focusing cylindrically bent perfect crystal Si(111) monochromators of different diffraction geometries were tested with the aim of evaluating their possible use in a stress instrument with an unusually small take‐off angle (2θ M ≃ 30°). The experiments showed that an Si crystal with reflecting planes (111) in the symmetric diffraction geometry provides a maximum figure of merit for accuracy in the peak position that is comparable to that achieved previously from an optimized Si(220) monochromator at 2θ M ≃ 55°.