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Structure of PbTe(SiO 2 )/SiO 2 multilayers deposited on Si(111)
Author(s) -
Kellermann Guinther,
Rodriguez Eugenio,
Jimenez Ernesto,
Cesar Carlos Lenz,
Barbosa Luiz Carlos,
Craievich Aldo Felix
Publication year - 2010
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s0021889810005625
Subject(s) - grazing incidence small angle scattering , materials science , amorphous solid , scattering , nanocrystal , deposition (geology) , substrate (aquarium) , thin film , analytical chemistry (journal) , crystallography , optics , nanotechnology , small angle neutron scattering , chemistry , paleontology , physics , neutron scattering , oceanography , chromatography , sediment , geology , biology
The structure of thin films composed of a multilayer of PbTe nanocrystals embedded in SiO 2 , named as PbTe(SiO 2 ), between homogeneous layers of amorphous SiO 2 deposited on a single‐crystal Si(111) substrate was studied by grazing‐incidence small‐angle X‐ray scattering (GISAXS) as a function of PbTe content. PbTe(SiO 2 )/SiO 2 multilayers were produced by alternately applying plasma‐enhanced chemical vapour deposition and pulsed laser deposition techniques. From the analysis of the experimental GISAXS patterns, the average radius and radius dispersion of PbTe nanocrystals were determined. With increasing deposition dose the size of the PbTe nanocrystals progressively increases while their number density decreases. Analysis of the GISAXS intensity profiles along the normal to the sample surface allowed the determination of the period parameter of the layers and a structure parameter that characterizes the disorder in the distances between PbTe layers.