Quantitative analysis of molecularly stacked layer structures in supported organic thin films by synchrotron grazing‐incidence X‐ray scattering

In this study, we derive a grazing‐incidence X‐ray scattering (GIXS) formula to analyze quantitatively GIXS patterns for molecularly stacked layer structures in substrate‐supported nanoscale thin films. We apply this formula in the quantitative analysis of GIXS patterns obtained for S ‐docosanylcysteine thin films on silicon substrates with native oxide layers. This analysis successfully provides information on the structural parameters and orientation of the molecular layer stack developed in S ‐docosanylcysteine thin films.