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Total reflection X‐ray fluorescence study of Langmuir monolayers on water surface
Author(s) -
Novikova Natalia N.,
Zheludeva Svetlana I.,
Konovalov Oleg V.,
Kovalchuk Mikhail V.,
Stepiina D.,
Myagkov Igor V.,
Godovsky Yulij K.,
Makarova Ni.,
Tereschenko Elena Yu.,
Yanusova Ludmila G.
Publication year - 2003
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s0021889803000189
Subject(s) - monolayer , fluorescence , langmuir , total internal reflection , x ray fluorescence , chemistry , analytical chemistry (journal) , reflection (computer programming) , surface pressure , molecule , materials science , optics , optoelectronics , aqueous solution , nanotechnology , physics , chromatography , computer science , mechanics , programming language , organic chemistry
X‐ray total external reflection fluorescence has been applied to detect an angular dependence of fluorescence yield modulated by evanescent/X‐ray standing wave pattern from metal‐rich organic monolayer alone on water surface. Theoretical consideration reveals that electric field intensity in a molecular monolayer is completely determined by an area per one molecule value that can be obtained from pressure‐area isotherm. This allows getting an ion position inside a monolayer from the corresponding fluorescence angular dependence. The possibilities of the technique have been used at the SR beamline ID10B (ESRF) to characterize Langmuir monolayers of phthalocyanines and cyclolinear polyorganosiloxanes formed on air/water interface.