Premium
Reflection of waveguided X‐rays in two‐dimensional nanostructures
Author(s) -
Pfeiffer Franz,
Salditt Tim,
David Christian
Publication year - 2002
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s0021889802006817
Subject(s) - waveguide , optics , total internal reflection , reflection (computer programming) , nanostructure , lithography , excitation , materials science , electron beam lithography , beam (structure) , nanometre , excited state , optoelectronics , layer (electronics) , physics , nanotechnology , resist , atomic physics , quantum mechanics , computer science , programming language
The internal reflection of an excited X‐ray waveguide mode in a synthetic nanostructure, defined by electron‐beam lithography, has been measured. In this device, the X‐ray beam is first coupled into a conventional vertical thin‐film waveguide structure and then reflected laterally at the quasi‐one‐dimensional edge of the waveguiding layer. The reflectivity of the quasi‐one‐dimensional interface has been recorded under simultaneous excitation of the (vertical) waveguide mode. The experiment constitutes an important step towards the production of a coherent nanometre‐sized X‐ray point source by two‐dimensionally defined waveguide structures.