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X‐ray monochromator combining high resolution with high intensity
Author(s) -
Servidori M.
Publication year - 2002
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s0021889801018489
Subject(s) - monochromator , optics , reflection (computer programming) , germanium , refraction , diffraction , physics , resolution (logic) , crystal (programming language) , wavelength , angular resolution (graph drawing) , rotation (mathematics) , beam (structure) , optoelectronics , geometry , silicon , mathematics , combinatorics , artificial intelligence , computer science , programming language
A two‐germanium‐crystal four‐220‐reflection () monochromator, combining high intensity with high resolution, is proposed in this work. The main characteristic is that only the first reflection is asymmetric. The asymmetry factor was chosen so as to allow mixing of asymmetric and symmetric reflections in a monolithic channel‐cut crystal without the need for rotation of the two monolith components to correct for the different refraction‐induced angular shifts of the reflection pair. It is demonstrated that the exit‐beam divergence in the diffraction plane and the fractional wavelength band‐pass are smaller by 40% than those of the widely used germanium 220 Bartels monochromator, while the photon flux collected from the source is larger by a factor of five. The optical features and performance of the monochromator are discussed and compared with those of other () monochromators reported in the literature.