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GISAXS study of Cu–Ni alloy clusters obtained by double ion implantation in silicate glasses
Author(s) -
Cattaruzza E.,
D'Acapito F.,
Gonella F.,
Longo A.,
Martorana A.,
Mattei G.,
Maurizio C.,
Thiaudière D.
Publication year - 2000
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s0021889800099878
Subject(s) - grazing incidence small angle scattering , materials science , nanoclusters , silicate , alloy , copper , nickel , scattering , volume fraction , ion implantation , dielectric , ion , analytical chemistry (journal) , chemical engineering , metallurgy , small angle neutron scattering , composite material , optics , nanotechnology , chemistry , neutron scattering , optoelectronics , physics , engineering , organic chemistry , chromatography
Sequential double ion implantation in silicate glasses has been used to realize copper‐nickel alloy nanoclusters embedded in the host dielectric matrix. A grazing incidence small‐angle X‐ray scattering experiment has been performed on copper+nickel implanted silicate glasses, to obtain information on the cluster size and size distribution, as well as on the volume fraction. The potential of the technique in the study of these composite glasses is discussed.