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A general approach in multilayer optical system design for SAXS
Author(s) -
Jiang L.,
Verman B.,
Joensen K.D.
Publication year - 2000
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s0021889800099787
Subject(s) - pinhole (optics) , optics , scattering , small angle x ray scattering , materials science , ray tracing (physics) , angular resolution (graph drawing) , resolution (logic) , light scattering , physics , computer science , mathematics , combinatorics , artificial intelligence
An approach to using multilayer optics for SAXS is discussed. The approach consists of employing a two‐dimensional multilayer focusing optic to monochromatize and intensify the x‐ray beam, and a pinhole system to further shape the beam. Depending on the sample scattering power, different pinhole systems can be used. With a two‐pinhole system, high flux can be achieved but with nonblocked parasitic scattering from the pinholes and scattering from multilayer reflectors. With a three‐pinhole system, parasitic scattering and scattering from multilayer are completely shielded beyond certain angular range for weak scattering samples. Using ray‐tracing method, the performances of the proposed systems are compared to the most commonly used graphite‐pinhole system and found to provide a factor 10 more flux for similar resolution and background requirements.