z-logo
open-access-imgOpen Access
Limits on Passivating Defects in Semiconductors: The Case of Si Edge Dislocations
Author(s) -
Tzu-Liang Chan,
Damien West,
Shengbai Zhang
Publication year - 2011
Publication title -
physical review letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.688
H-Index - 673
eISSN - 1079-7114
pISSN - 0031-9007
DOI - 10.1103/physrevlett.107.035503
Subject(s) - materials science , semiconductor , enhanced data rates for gsm evolution , condensed matter physics , silicon , optoelectronics , physics , computer science , telecommunications

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom