Relative importance of electrostatic and van der Waals forces in particle adhesion to rough conducting surfaces | Zendy

Siddharth Rajupet | Zendy; Adriaan A. Riet | Zendy; Qizan Chen | Zendy; Mamadou Sow | Zendy; Daniel J. Lacks | Zendy

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Relative importance of electrostatic and van der Waals forces in particle adhesion to rough conducting surfaces

Author(s) -

Siddharth Rajupet,

Adriaan A. Riet,

Qizan Chen,

Mamadou Sow,

Daniel J. Lacks

Publication year - 2021

Publication title -

physical review. e

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.896

H-Index - 304

eISSN - 2470-0053

pISSN - 2470-0045

DOI - 10.1103/physreve.103.042906

Subject(s) - van der waals force , electrostatics , adhesion , particle (ecology) , surface finish , surface roughness , polarizability , van der waals strain , hamaker constant , van der waals surface , chemical physics , van der waals radius , electrostatic force microscope , surface force , classical mechanics , chemistry , nanotechnology , condensed matter physics , materials science , atomic force microscopy , physics , composite material , molecule , oceanography , geology , organic chemistry

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