Open AccessSputter yield of curved surfaces
Author(s) -
Herbert M. Urbassek,
R. Mark Bradley,
Maureen L. Nietiadi,
W. Möller
Publication year - 2015
Publication title -
physical review. b, condensed matter and materials physics
Language(s) - English
Resource type - Journals
eISSN - 1538-4489
pISSN - 1098-0121
DOI - 10.1103/physrevb.91.165418
Subject(s) - sputtering , curvature , monte carlo method , yield (engineering) , materials science , ion , collision cascade , silicon , perpendicular , cascade , atomic physics , molecular physics , computational physics , physics , thin film , geometry , nanotechnology , chemistry , composite material , optoelectronics , statistics , chromatography , quantum mechanics , mathematics