Open AccessBuried Pd slows self-diffusion on Cu(001)
Author(s) -
Ezra Bussmann,
Ivan Ermanoski,
Peter J. Feibelman,
N. C. Bartelt,
G. L. Kellogg
Publication year - 2011
Publication title -
physical review b
Language(s) - Uncategorized
Resource type - Journals
eISSN - 1538-4489
pISSN - 1098-0121
DOI - 10.1103/physrevb.84.245440
Subject(s) - electromigration , materials science , diffusion , alloy , monolayer , surface diffusion , ostwald ripening , low energy electron microscopy , self diffusion , condensed matter physics , chemical physics , electron microscope , crystallography , thermodynamics , nanotechnology , chemistry , physics , metallurgy , composite material , optics , adsorption , self service , business , marketing
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