Open AccessEffect of annealing and applied bias on barrier shape in CoFe/MgO/CoFe tunnel junctions
Author(s) -
Yuzi Liu,
Ann N. Chiaramonti,
Daniel K. Schreiber,
Hyunsoo Yang,
S. Parkin,
Olle Hein,
A. K. PetfordLong
Publication year - 2011
Publication title -
physical review b
Language(s) - English
Resource type - Journals
eISSN - 1538-4489
pISSN - 1098-0121
DOI - 10.1103/physrevb.83.165413
Subject(s) - annealing (glass) , materials science , electron holography , quantum tunnelling , transmission electron microscopy , condensed matter physics , rectangular potential barrier , tunnel magnetoresistance , crystallinity , composite material , optoelectronics , nanotechnology , physics , layer (electronics)
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