z-logo
open-access-imgOpen Access
Model for stress and volume changes of a thin film on a substrate upon annealing: Application to amorphous Mo/Si multilayers
Author(s) -
O. B. Loopstra,
E. R. van Snek,
Th. H. de Keijser,
E. J. Mittemeijer
Publication year - 1991
Publication title -
physical review. b, condensed matter
Language(s) - English
Resource type - Journals
eISSN - 1095-3795
pISSN - 0163-1829
DOI - 10.1103/physrevb.44.13519
Subject(s) - amorphous solid , materials science , annealing (glass) , thin film , stress relaxation , condensed matter physics , composite material , crystallography , creep , nanotechnology , chemistry , physics

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom