Interaction of F and Cl with silicon surfaces
Author(s) -
P. J. van den Hoek,
Walter Ravenek,
E. J. Baerends
Publication year - 1988
Publication title -
physical review. b, condensed matter
Language(s) - English
Resource type - Journals
eISSN - 1095-3795
pISSN - 0163-1829
DOI - 10.1103/physrevb.38.12508
Subject(s) - halogen , silicon , substrate (aquarium) , etching (microfabrication) , adsorption , materials science , atomic physics , binding energy , flux (metallurgy) , plasma , molecular physics , chemistry , nanotechnology , physics , optoelectronics , nuclear physics , layer (electronics) , metallurgy , alkyl , oceanography , organic chemistry , geology
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