Open AccessA statistical method to optimize the chemical etching process of zinc oxide thin films
Author(s) -
David D. Lynes,
Hengky Chandrahalim,
Justin M. Brown,
Karanvir Singh,
Kyle T. Bodily,
Kevin Leedy
Publication year - 2022
Publication title -
royal society open science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.84
H-Index - 51
ISSN - 2054-5703
DOI - 10.1098/rsos.211560
Subject(s) - zinc , etching (microfabrication) , thin film , materials science , process (computing) , isotropic etching , nanotechnology , computer science , metallurgy , layer (electronics) , operating system
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