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The maintenance of HM silencing is regulated by arginine residues of histone H4 tail in S. cerevisiae
Author(s) -
Yeom Soojin,
Lee JungShin
Publication year - 2019
Publication title -
the faseb journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.709
H-Index - 277
eISSN - 1530-6860
pISSN - 0892-6638
DOI - 10.1096/fasebj.2019.33.1_supplement.622.9
Subject(s) - histone methyltransferase , gene silencing , biology , histone h2a , histone code , histone , histone h3 , genetics , saccharomyces cerevisiae , epigenetics , histone h4 , gene , nucleosome
Transcriptional gene repression is one of the significant concepts for the epigenetic gene expression. Histone modifications are critical factors for the maintenance of gene silencing in eukaryotic systems. However, none of the histone modifications as epigenetic silencing markers is conserved in Saccharomyces cerevisiae . To identify global epigenetic silencing marker from yeast to human, we developed a screening method using the system for the maintenance of yeast mating type. We used the yeast histone point mutant library, which is a collection of strains containing alanine‐substituted histone residue, and yeast single‐gene knockout library. From this screening, we found histone arginine residue is required for the maintenance of HM silencing in S. cerevisiae . Among these histone residues, two basic residues of histone H4 tail including H4R17 and H4R19, are important for the HM silencing. These basic amino acids are also known to control the telomeric silencing by recruiting Dot1, which is a specific methyltransferase for histone H3 lysine 79. We found that these two amino acids can maintain HM silencing with their positive charge, but their regulation for the HM silencing is not mediated by Dot1. Support or Funding Information This research is supported by NRF‐2015R1D1A1A02061743 and NRF‐2015R1A4A1041105. This abstract is from the Experimental Biology 2019 Meeting. There is no full text article associated with this abstract published in The FASEB Journal .