Open AccessHigh-performance deterministic in situ electron-beam lithography enabled by cathodoluminescence spectroscopy
Author(s) -
Sven Rodt,
Stephan Reitzenstein
Publication year - 2021
Publication title -
nano express
Language(s) - English
Resource type - Journals
ISSN - 2632-959X
DOI - 10.1088/2632-959x/abed3c
Subject(s) - cathodoluminescence , lithography , electron beam lithography , nanolithography , quantum dot , materials science , nanophotonics , nanotechnology , resist , optoelectronics , stencil lithography , quantum sensor , quantum computer , quantum , physics , fabrication , quantum simulator , luminescence , layer (electronics) , quantum mechanics , medicine , alternative medicine , pathology
The application of solid-state quantum emitters in real-world quantum information technologies requires precise nanofabrication platforms with high process yield. Self-assembled semiconductor quantum dots with excellent emission properties have proven to be among the best candidates to meet the needs of a number of novel quantum photonic devices. However, their spatial and spectral positions vary statistically on a scale that is far too large for their system integration via fixed lithography and inflexible processing schemes. We solve this severe problem by introducing a flexible and deterministic manufacturing scheme based on precise and convenient cathodoluminescence spectroscopy followed by high-resolution electron-beam lithography. The basics and application examples of this advanced in situ electron-beam lithography are described in this article. Although we focus here on quantum dots as photon emitters, this nanotechnology concept is very well suited for the fabrication of a variety of quantum nanophotonic devices based on quantum emitters that exhibit suitably strong cathodoluminescence signals.