Open AccessMagnetic force assisted thermal nanoimprint lithography (MF-TNIL) for cost-effective fabrication of 2D nanosquare array
Author(s) -
Rakesh S. Moirangthem
Publication year - 2020
Publication title -
nano express
Language(s) - English
Resource type - Journals
ISSN - 2632-959X
DOI - 10.1088/2632-959x/ab934d
Subject(s) - nanoimprint lithography , nanolithography , materials science , polydimethylsiloxane , fabrication , nanotechnology , soft lithography , lithography , next generation lithography , photolithography , resist , optoelectronics , electron beam lithography , layer (electronics) , medicine , alternative medicine , pathology
The work presented here describes a simple, low-cost, and unconventional technique to fabricate a 2D nanosquare array using magnetic force assisted thermal nanoimprint lithography (MF-TNIL). The nanofabrication process involves two steps: (i) fabrication of a 2D nanosquare array template on a laminated plastic sheet via sequential thermal nanoimprinting of linear nanograting polydimethylsiloxane (PDMS) stamp, and (ii) reversal imprinting of template on UV curable polymer using soft UV-nanoimprint lithography. Without using an expensive nanofabrication tool, our proposed technique can fabricate nanosquare array over an area of 1 × 1 cm 2 with individual nanosquare having a feature size of about 383 nm × 354 nm × 70 nm. We believe that our proposed MF-TNIL represents a promising nanofabrication technique that will allow fabricating various types of nanostructures for their applications in developing sensors, anti-reflective surfaces, self-cleaning surfaces, etc.