Open AccessIon formation in an argon and argon-oxygen gas mixture of a magnetron sputtering discharge
Author(s) -
R. Hippler,
Martin Čada,
Vítězslav Straňák,
Zdeněk Hubička
Publication year - 2019
Publication title -
journal of physics communications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.407
H-Index - 17
ISSN - 2399-6528
DOI - 10.1088/2399-6528/ab1e82
Subject(s) - argon , analytical chemistry (journal) , materials science , chemistry , organic chemistry , chromatography
Formation of singly and doubly charged Ar q + and Ti q + ( q = 1,2) and of molecular Ar 2 + , ArTi + , and Ti 2 + ions in a direct current magnetron sputtering discharge with a Ti cathode and argon as working gas was investigated with the help of energy-resolved mass spectrometry. Measured ion energy distributions consist of low-energy and high-energy components resembling different formation processes. Intensities of Ar 2 + and ArTi + dimer ions strongly increase with increasing gas pressure. Addition of oxygen gas leads to the formation of positively charged O + , O 2 + , and TiO + and of negatively charged O − and O 2 − ions.