Open AccessInfluence of the rf power and oxygen content on structural, electrical, and optical properties of V 2 O 5 thin films prepared via reactive radio frequency sputtering
Author(s) -
S. Tipawan Khlayboonme,
Amorn Thedsakhulwong
Publication year - 2022
Publication title -
materials research express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.383
H-Index - 35
ISSN - 2053-1591
DOI - 10.1088/2053-1591/ac827a
Subject(s) - materials science , phase (matter) , tetragonal crystal system , electrical resistivity and conductivity , sputtering , thin film , analytical chemistry (journal) , monoclinic crystal system , volume (thermodynamics) , radio frequency , rf power amplifier , content (measure theory) , sputter deposition , crystal structure , crystallography , optoelectronics , chemistry , nanotechnology , thermodynamics , electrical engineering , physics , mathematical analysis , cmos , mathematics , organic chemistry , chromatography , amplifier , engineering
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