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Enhanced crystalline quality of non-polar a-plane AlGaN epitaxial film grown with Al-composition-graded AlGaN intermediate layer
Author(s) -
Abbas Nasir,
Xiong Zhang,
Liang Lu,
Jin Zou,
Jiadong Lyu,
Yiping Cui
Publication year - 2021
Publication title -
materials research express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.383
H-Index - 35
ISSN - 2053-1591
DOI - 10.1088/2053-1591/abff0a
Subject(s) - epitaxy , materials science , photoluminescence , sapphire , layer (electronics) , metalorganic vapour phase epitaxy , surface roughness , polar , analytical chemistry (journal) , substrate (aquarium) , chemical vapor deposition , optoelectronics , optics , nanotechnology , composite material , chemistry , laser , physics , oceanography , chromatography , astronomy , geology
The non-polar a -AlGaN epitaxial film was successfully grown on the semi-polar r- sapphire substrate by metal-organic chemical vapor deposition technique. An Al-composition-graded Al x Ga 1−x N (x = 0.0 to 1.0) intermediate layer with varying film thickness from 260 to 695 nm was deposited between the high-temperature AlN layer and the non-polar a- AlGaN epitaxial film to enhance the morphological and crystalline quality. The non-polar a -AlGaN epitaxial films were investigated by using atomic force microscopy (AFM), high-resolution x-ray diffraction, photoluminescence (PL) spectroscopy and the Hall effect measurement techniques. The characterisation results indicate substantial improvements in surface morphology and crystalline quality for the non-polar a- AlGaN epitaxial film grown by adding an Al-composition-graded AlGaN intermediate layer. The surface roughness measured from AFM and the defect-related emission (yellow band) relative to the near-band-edge emission from PL spectra were decreased significantly by optimizing the layer thickness of the Al-composition-graded AlGaN layer. A relatively low background carrier concentration down to −4.4 ×  10 17 cm −3 was achieved from Hall effect measurement for the non-polar a- AlGaN epitaxial film.

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