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Temperature and pH effect on reaction mechanism and particle size of nanostructured Co3O4 thin films obtained by sol-gel/dip-coating
Author(s) -
M. E. Andrade-Sanchez,
M.A. Hernández-Pérez,
G. García-Pacheco,
M. Ortega-Avilés
Publication year - 2021
Publication title -
materials research express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.383
H-Index - 35
ISSN - 2053-1591
DOI - 10.1088/2053-1591/abe65a
Subject(s) - sol gel , phase (matter) , citric acid , tetrahydrate , particle size , materials science , cobalt , methanol , fourier transform infrared spectroscopy , particle (ecology) , dip coating , thin film , nuclear chemistry , analytical chemistry (journal) , chemical engineering , inorganic chemistry , chemistry , coating , crystal structure , crystallography , nanotechnology , organic chemistry , metallurgy , oceanography , geology , engineering
This article reports the preparation of Co 3 O 4 phase films by sol-gel. Initially, the precursor solution was prepared by the reaction of cobalt acetate tetrahydrate with methanol. Clean glass substrates were dipped into the solution for 4 times with a speed of dipping of 2 cm per minute. Afterwards, the films deposited were thermally treated at 500 °C to produce the Co 3 O 4 phase. FTIR, UV-Vis and XRD techniques were used to analyze the effects of temperature and pH on reaction carried out on the precursor solution. While the microstructural characterization of thermally treated films was performed through XRD and SEM techniques. In parallel, were studied the thermal decompositions of both Co(CH 3 COO) 2 phase as precursor solution S2 powders using TGA-DTA techniques. The results show that Co 3 (CH 3 COO) 5 OH phase was identified as the precursor to the Co 3 O 4 phase. It was observed that the synthesis temperature promotes the formation reaction of Co(CH 3 COO) 5 OH. While the decrease in pH by addition of citric acid had 2 effects. The first was to delay the formation reaction, and the second was to decrease the particle size of phase Co 3 O 4  < 10 nm.

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