Open AccessToxicity of GO and rGO suspension against P. acnes: physical puncture and oxidative stress
Author(s) -
Dongfang Dai,
Hao Qu,
Jianxin Lv,
Xueqian Hu,
Jian Lv,
Qianxu Ye,
Zesi Lin,
Jinming Cai,
Guanlin Wang
Publication year - 2021
Publication title -
materials research express
Language(s) - English
Resource type - Journals
ISSN - 2053-1591
DOI - 10.1088/2053-1591/abe42a
Subject(s) - propionibacterium acnes , graphene , acne , oxide , oxidative stress , antibacterial activity , chemistry , microbiology and biotechnology , medicine , bacteria , nanotechnology , biology , materials science , dermatology , biochemistry , organic chemistry , genetics
Acne vulgaris associated with Propionibacterium acnes ( P. acnes ) remains one of the most common skin diseases, while lacking of effective and non-resistant treatments. Graphene inclusing graphene oxide (GO) and reduced graphene oxide (rGO) have been triggering abundant attentions due to their astonishing performances in multi research areas. Here, the GO and rGO suspensions with different concentrations and sizes against P. acnes were investigated. The higher the concentration while the smaller the size distribution led to the better the antibacterial performance. And the loss of viability of P. acnes can surprisely achieve 72% under a 100 μ g 10 000 mesh rGO existed which was induced by physical puncture and oxidative stress. Furthermore, the physiological activities of P. acnes will reduce the GO to rGO which further accelerate its death. This study will provide a rapid, effective and non-resistant method for the treatment of acne.