Open AccessLow-temperature deposition and hardness enhancement of α-(Al,Cr)2O3 films by reactive high power pulsed magnetron sputtering
Author(s) -
Yitian Cheng,
Chenglin Chu,
Peng Zhou
Publication year - 2020
Publication title -
materials research express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.383
H-Index - 35
ISSN - 2053-1591
DOI - 10.1088/2053-1591/abc7e1
Subject(s) - materials science , nanoindentation , high power impulse magnetron sputtering , scanning electron microscope , sputter deposition , thin film , pulsed dc , cavity magnetron , sputtering , transmission electron microscopy , corundum , metallurgy , composite material , analytical chemistry (journal) , nanotechnology , chemistry , chromatography
This paper offers a method to grow corundum structure thin films of α -(Al,Cr) 2 O 3 in a High Power Pulsed Magnetron Sputtering (HPPMS) system. The films were characterized by grazing incidence x-ray diffraction (GIXRD), scanning electron microscope (SEM), transmission electron microscope (TEM) and nanoindentation. The results indicate that stoichiometric α -(Al,Cr) 2 O 3 film could be deposited at 540 °C without the formation of other metastable phases. The stable process of the magnetron sputtering ensures the smooth and compact surface of the film composed of nano-scale particles. The Cr in films can induce the formation of solid solution and enhance the mechanical property of the films. The hardness of the α -(Al,Cr) 2 O 3 was calculated as ∼25.6 GPa, which is much higher than that of the film deposited using the Al target. These results are considered have positive effect on the low-cost depositing α -phase alumina films on high speed steel substrates as cutting tools.