Open AccessAnnealing temperature induced improved crystallinity of YSZ thin film
Author(s) -
Nurhamizah Ahmad Rusli,
Rosnita Muhammad,
Sib Krishna Ghoshal,
Hadi Nur,
Nafarizal Nayan
Publication year - 2020
Publication title -
materials research express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.383
H-Index - 35
ISSN - 2053-1591
DOI - 10.1088/2053-1591/ab9039
Subject(s) - crystallinity , materials science , crystallite , annealing (glass) , yttria stabilized zirconia , thin film , sputter deposition , high resolution transmission electron microscopy , analytical chemistry (journal) , cavity magnetron , atmospheric temperature range , composite material , mineralogy , sputtering , metallurgy , ceramic , nanotechnology , cubic zirconia , transmission electron microscopy , chemistry , physics , meteorology , chromatography
Six YSZ thin films (YSZTFs) were prepared at varied annealing temperature (380 °C to 600 °C) by radio frequency magnetron sputtering method. Glancing angle x-ray diffraction (GAXRD) pattern revealed the polycrystalline nature of all films with crystallite size in the range of 9 to 15 nm. Sample annealed at 400 °C displayed the lowest microstrain (0.262) and crystallinity (60%). FESEM images disclosed dense, homogeneous and crack free growth of annealed samples compared to as-deposited one. EDX spectra detected the right elemental compositions of films. AFM images showed growth evolution of YSZ grains with size range between 0.2 to 5 nm and improved films’ surface roughness. HRTEM measurement of the studied YSZTFs exhibited lattice orientation and atomic structure of nucleated YSZ nanocrystallites. Furthermore, film annealed at 500 °C divulged less oriented structure because of dislocation.