Open AccessSputtered Mo-bilayer thin films with reduced thickness and improved electrical resistivity
Author(s) -
Filiz Keleş,
Yavuz Atasoy,
Ayşe Seyhan
Publication year - 2019
Publication title -
materials research express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.383
H-Index - 35
ISSN - 2053-1591
DOI - 10.1088/2053-1591/ab6f33
Subject(s) - bilayer , materials science , electrical resistivity and conductivity , sputtering , thin film , layer (electronics) , sputter deposition , composite material , optoelectronics , nanotechnology , chemistry , electrical engineering , biochemistry , membrane , engineering
In this study, Mo-bilayer film, the thickness of which was reduced to approximately 270 nm with a very low resistivity of 14 μ Ω.cm, was successfully grown by DC magnetron sputter. The Mo-bilayer, whose bottom and top layers were obtained by high pressure sputter (HPS) and low pressure sputter (LPS) respectively, demonstrates good adhesivity and crystalline properties, together with high reflectance. In order to obtain Mo-bilayer with these improved properties, we first determined the optimal growth temperature and pressure parameters by checking the structural and electrical properties respectively of Mo-single layers. As a result, we achieved a deposit of Mo-bilayer thin film that can be used as a good back contact layer in solar cell applications, both in terms of material cost saving and its superior properties, even at such low thickness.