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Oxidation and reduction processes in Ni/Cu/Cr/Si(100) thin films under low-energy ion irradiation
Author(s) -
І. O. Kruhlov,
І. А. Vladymyrskyi,
Oleksandr Dubikovskyi,
Sergiy S Sidorenko,
Tomio Ebisu,
Kenichi Kato,
Osami Sakata,
Tetsuya Ishikawa,
Yusuke Iguchi,
G.A. Langer,
Zoltán Erdélyi,
S. М. Voloshko
Publication year - 2020
Publication title -
materials research express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.383
H-Index - 35
ISSN - 2053-1591
DOI - 10.1088/2053-1591/ab6382
Subject(s) - materials science , x ray photoelectron spectroscopy , crystallite , irradiation , analytical chemistry (journal) , ion , sputtering , fluence , thin film , passivation , sputter deposition , layer (electronics) , chemistry , nanotechnology , metallurgy , chemical engineering , chromatography , engineering , physics , organic chemistry , nuclear physics

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