Open AccessPlasma-prepared arsenic telluride films: relationship between physico-chemical properties on the parameters of the deposition process
Author(s) -
Leonid Mochalov,
А. А. Логунов,
А. В. Маркин,
Anna Kitnis,
В. М. Воротынцев
Publication year - 2020
Publication title -
materials research express
Language(s) - English
Resource type - Journals
ISSN - 2053-1591
DOI - 10.1088/2053-1591/ab62ea
Subject(s) - arsenic , deposition (geology) , telluride , materials science , crystallization , argon , tellurium , analytical chemistry (journal) , torr , thin film , chemical engineering , chemistry , metallurgy , nanotechnology , environmental chemistry , thermodynamics , organic chemistry , paleontology , sediment , engineering , physics , biology