Open AccessPlasma-prepared arsenic telluride films: relationship between physico-chemical properties on the parameters of the deposition process
Author(s) -
Leonid Mochalov,
Alexander Logunov,
Alexey V. Markin,
Anna Kitnis,
В. М. Воротынцев
Publication year - 2019
Publication title -
materials research express
Language(s) - English
Resource type - Journals
ISSN - 2053-1591
DOI - 10.1088/2053-1591/ab62ea
Subject(s) - arsenic , deposition (geology) , telluride , crystallization , tellurium , materials science , argon , torr , analytical chemistry (journal) , thin film , plasma , chemical engineering , chemistry , nanotechnology , metallurgy , environmental chemistry , thermodynamics , organic chemistry , geology , paleontology , physics , sediment , engineering , quantum mechanics
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