Open AccessTwo-dimensional MoO 3 via a top-down chemical thinning route
Author(s) -
F. H. Rahman,
Taimur Ahmed,
Sumeet Walia,
Edwin Mayes,
Sharath Sriram,
Madhu Bhaskaran,
Sivacarendran Balendhran
Publication year - 2017
Publication title -
2d materials
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 2.702
H-Index - 72
ISSN - 2053-1583
DOI - 10.1088/2053-1583/aa79d5
Subject(s) - planar , materials science , isotropic etching , thinning , rendering (computer graphics) , semiconductor , transistor , nanotechnology , optoelectronics , band gap , etching (microfabrication) , engineering physics , computer science , electrical engineering , layer (electronics) , ecology , computer graphics (images) , engineering , voltage , biology
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