WSe 2 -contact metal interface chemistry and band alignment under high vacuum and ultra high vacuum deposition conditions
Author(s) -
Christopher M. Smyth,
Rafik Addou,
Stephen McDonnell,
Christopher L. Hinkle,
Robert M. Wallace
Publication year - 2017
Publication title -
2d materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.702
H-Index - 72
ISSN - 2053-1583
DOI - 10.1088/2053-1583/aa6bea
Subject(s) - x ray photoelectron spectroscopy , ultra high vacuum , schottky barrier , chemistry , tungsten , deposition (geology) , fermi level , vacuum deposition , van der waals force , metal , transition metal , analytical chemistry (journal) , materials science , nanotechnology , electron , thin film , chemical engineering , optoelectronics , catalysis , molecule , engineering , biology , paleontology , biochemistry , chromatography , quantum mechanics , physics , organic chemistry , diode , sediment
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