Open AccessDeep-ultraviolet Raman investigation of silicon oxide: thin film on silicon substrate versus bulk material
Author(s) -
Paweł Borowicz,
Mariusz Latek,
W. Rzodkiewicz,
A. Łaszcz,
Andrzej Czerwiński,
J. Ratajczak
Publication year - 2012
Publication title -
advances in natural sciences nanoscience and nanotechnology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.476
H-Index - 40
ISSN - 2043-6262
DOI - 10.1088/2043-6262/4/045003
Subject(s) - silicon , materials science , raman spectroscopy , substrate (aquarium) , raman scattering , silicon oxide , optoelectronics , strained silicon , oxide , layer (electronics) , crystalline silicon , optics , nanotechnology , amorphous silicon , metallurgy , silicon nitride , physics , oceanography , geology