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Enhancement of Deposition Process Controlling in Electron Beam Metal Wire Deposition Method
Author(s) -
А. В. Щербаков,
R. V. Rodyakina,
R. R. Klyushin
Publication year - 2020
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/969/1/012105
Subject(s) - deposition (geology) , layer (electronics) , cathode ray , electron beam induced deposition , materials science , scanning electron microscope , electron , beam (structure) , signal (programming language) , layer by layer , metal , monte carlo method , process (computing) , optics , nanotechnology , computer science , physics , composite material , metallurgy , mathematics , paleontology , statistics , operating system , quantum mechanics , sediment , biology , programming language
The urgency of improving control systems for electron beam metal wire deposition method is proved in terms of creating methods for controlling the geometric parameters of deposited layer. It is shown that to solve this problem in electron beam metal wire deposition method, it is advisable to use reflected electron signal detection when scanning the deposited layer. Using a mathematical model based on the application of continuous loss approximation and Monte-Carlo method, the probe characteristics recorded during cylindrical layer scanning are investigated. Experimental verification of the results obtained was carried out using an electron-beam technological installation. The effect of the distance between the layer and electron collector on the recorded signals is investigated. The possibility of using this method for simultaneous control of deposited layer height and width is shown.

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