Open AccessGrounds and problem statement for software complex for photolithography optimization for minimization of losses in optical structures of photonic integrated circuits
Author(s) -
Andrey Sharapov,
E. S. Shamin,
Ilya Skuratov,
Е. С. Горнев
Publication year - 2020
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/939/1/012070
Subject(s) - photolithography , photonics , photonic integrated circuit , software , electronic engineering , signal (programming language) , computer science , process (computing) , electronic circuit , minification , materials science , optoelectronics , engineering , electrical engineering , programming language , operating system
The losses in optical components are the key obstacle in development of photonic integrated circuits (PIC). This makes the developers to include additional signal gain elements into the optical scheme. One of the major and optimizable factors of signal loss is the sidewall roughness of the optical components. After analysis of factors causing the line-edge roughness (LER), we developed the basic model of the roughness emerging process during forming of photolithography nanostructures. We proposed an approach to optimize the photolithography process in order to minimize the optical losses in fabricated optical structures. The software complex on the basis of this approach is currently under development.